Laser diode with silicon
A laser Diode with silicon is a laser Diode of micrometric size whose guide of wave is cut out in silicon.
History
This type of lasers diode was developed for the first time by Intel in 2006.
Operation
The generation of the radiation is done in an indium phosphide diode. The light thus generated is made coherent in a guide of silicon wave of ten µm of width gràce to the Raman Diffusion.
Manufacture
The manufactoring process traditional of integrated circuits are used for the guide of wave. The fixing of the Phosphure of indium to the Silicium is done by adherence: a cold oxygen plasma is applied to the 2 parts, creating a layer of 25 oxygen atoms, which will maintain the silicon and the phosphide of indium together.
Applications
No application is known to date. The miniaturization and the use of manufactoring processes standard make hope for a generalized use for the numerical transmission and calculation (optical Processeur ODSP). Nevertheless this technology is not industrialized to date and remains at the stage of prototype.
See too
External bonds
- Article on JDN solutions
- Article Futura Sciences
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